James W Martin

Title: Innovations of James W. Martin

Introduction

James W. Martin is an accomplished inventor based in Bethel Park, PA (US). He has made significant contributions to the field of photoimageable compositions, particularly through his innovative patent. His work is recognized for enhancing the properties of electrodepositable photoimageable resist compositions.

Latest Patents

James W. Martin holds a patent for "Electrodepositable photoimageable compositions with improved edge." This invention provides an improved electrodepositable photoimageable resist composition that includes a photosensitive composition and a microgel. The photosensitive composition can be either a negative-acting or a positive-acting photoresist. Furthermore, the photoresist component can be either cationic or anionic. The microgel consists of a plurality of crosslinked organic particles that can form a stable aqueous dispersion. The microgel is present in an amount ranging from about 0.1 to about 30 weight percent, based on the total weight of the resin solids in the photoimageable resist composition. At these concentrations, the microgels promote edge coverage without significantly reducing the photosensitivity and developability properties of the photosensitive composition.

Career Highlights

James W. Martin is associated with PPG Industries, Inc., where he has contributed to various projects and innovations. His expertise in photoimageable compositions has positioned him as a valuable asset in the field of materials science.

Collaborations

James has collaborated with Charles F. Kahle, II, enhancing the development of innovative solutions in their field.

Conclusion

James W. Martin's contributions to the field of photoimageable compositions demonstrate his innovative spirit and dedication to advancing technology. His patent reflects a significant step forward in the development of electrodepositable photoimageable resist compositions.