This inventor holds 3 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 1993-1995.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1993-1995
Title: Innovations by James V Rinnovatore
Introduction
James V Rinnovatore is an accomplished inventor based in Nazareth, PA (US). He has made significant contributions to the field of chemical-vapor-deposition systems, holding a total of 3 patents. His work focuses on methods to reduce particulate contamination, which is crucial for maintaining the integrity of various industrial processes.
Latest Patents
Rinnovatore's latest patents include a method of reducing particulate contaminants in a chemical-vapor-deposition system. This method involves a series of steps to fill the reaction chamber with a reactive gas, exhaust it using a vacuum pump, and backfill the chamber while preventing the generation of eddy currents that could introduce contaminants. Another notable patent is a particulate reduction baffle with a wafer catcher designed for use in an epitaxial reactor system. This device prevents particulate contaminants from re-entering the reaction chamber during back-filling operations.
Career Highlights
James V Rinnovatore is currently employed at Applied Materials, Inc., where he continues to innovate and develop solutions for the semiconductor industry. His expertise in chemical-vapor-deposition systems has positioned him as a key player in enhancing the efficiency and cleanliness of manufacturing processes.
Collaborations
Throughout his career, Rinnovatore has collaborated with notable colleagues such as Paul L Deaton and Norma B Riley. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
James V Rinnovatore's contributions to the field of chemical-vapor-deposition systems exemplify the importance of innovation in technology. His patents not only address critical challenges in the industry but also pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
