Company Filing History:
Years Active: 2006
Title: Innovations of James T Y Lin in Cyclic Siloxanes
Introduction
James T Y Lin is an accomplished inventor based in Austin, TX (US). He has made significant contributions to the field of materials science, particularly in the development of methods for purifying cyclic siloxanes. His innovative work has implications for the production of low-dielectric constant thin films, which are essential in various electronic applications.
Latest Patents
James T Y Lin holds a patent titled "Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films." This patent describes a process for reducing the levels of water and other impurities in cyclosiloxanes through azeotropic distillation or by using an adsorbent bed material. The purified cyclosiloxane material is crucial for forming low-dielectric constant thin films with dielectric constants of less than 3.0, ideally between 2.8 and 2.0.
Career Highlights
James T Y Lin is associated with Advanced Technology Materials, Inc., where he applies his expertise in materials science. His work focuses on enhancing the quality and performance of materials used in electronic devices. With a patent portfolio that includes 1 patent, he has established himself as a key figure in his field.
Collaborations
Throughout his career, James has collaborated with notable colleagues, including Chongying Xu and Thomas H Baum. These collaborations have contributed to the advancement of research and development in materials science.
Conclusion
James T Y Lin's innovative methods for purifying cyclic siloxanes represent a significant advancement in the field of materials science. His contributions are vital for the development of low-dielectric constant thin films, which play a crucial role in modern electronics.