This inventor holds 2 USPTO granted patents. Top assignees: Imtec Corporation, Polyonics, Inc.. Active years: 1993-2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1993-2012
Title: Innovations by James R. Williams
Introduction
James R. Williams is an accomplished inventor based in Keene, NH (US). He holds two patents that showcase his innovative contributions to technology and materials science. His work focuses on developing methods and systems that address practical challenges in various industries.
Latest Patents
One of his latest patents is titled "Method and apparatus for the detection of counterfeiting." This invention provides a system for counterfeiting countermeasures, which includes a first authenticity indicator in a print substrate coating and a second authenticity indicator in a print generating matrix. The system is designed to detect these indicators within a print pattern, enhancing security against counterfeiting.
Another significant patent by Williams is the "Contaminated-surface applicator system." This invention outlines a method and apparatus for applying and adhering an adhesive-backed label to a material's surface, even in the presence of contaminants like sap. The method involves applying a surface preparation layer that restores the adhesive force between the label and the material, ensuring effective labeling.
Career Highlights
Throughout his career, James R. Williams has made notable contributions to the field of invention. He has worked with reputable companies, including Imtec Corporation and Polyonics, Inc. His experience in these organizations has allowed him to refine his skills and develop innovative solutions to complex problems.
Collaborations
Due to space constraints, the collaborations section will be omitted.
Conclusion
James R. Williams is a notable inventor whose work has led to significant advancements in counterfeiting detection and adhesive application technologies. His patents reflect a commitment to innovation and practical problem-solving in various industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile