Rochester, NY, United States of America

James R Owen

This inventor holds 1 USPTO granted patent. Top assignee: Eastman-Kodak Company. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James R Owen. Retrieved from https://idiyas.com/inventor/james-r-owen-718hlsez

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1995

Loading Chart...
1 patent (USPTO):Explore Patents

Title: James R Owen: Innovator in Photographic Technology

Introduction

James R Owen is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of photographic technology, particularly with his innovative patent that enhances the functionality of photographic elements.

Latest Patents

James R Owen holds a patent for a "Photographic element having a transparent magnetic recording layer." This invention comprises a support with a light-sensitive layer, a transparent magnetic recording layer, and a transparent reinforced filler layer. The transparent magnetic recording layer includes a polymeric binder and ferro-magnetic particles, which are designed to improve the performance of photographic elements.

Career Highlights

James R Owen is associated with Eastman Kodak Company, a leader in imaging technology. His work at this esteemed company has allowed him to contribute to advancements in photographic materials and processes.

Collaborations

Throughout his career, James has collaborated with notable colleagues, including Ronald Myron Wexler and Lawrence A Rowley. These collaborations have fostered innovation and development in the field of photography.

Conclusion

James R Owen's contributions to photographic technology through his patent and work at Eastman Kodak Company highlight his role as an influential inventor. His innovative approach continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…