San Jose, CA, United States of America

James R Maloney

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 1992-1994.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 402(Granted Patents)


Company Filing History:


Years Active: 1992-1994

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovations of James R. Maloney

Introduction

James R. Maloney is a notable inventor based in San Jose, California. He has made significant contributions to the field of epitaxial deposition, holding two patents that showcase his innovative approach to technology. His work is primarily associated with Applied Materials, Inc., a leading company in the semiconductor industry.

Latest Patents

Maloney's latest patents include a "Method for Epitaxial Deposition" and a "Method and Apparatus for Epitaxial Deposition." Both patents describe a cooling air flow path that extends from a blower through a tapered input duct to a large plenum chamber. This chamber coaxially surrounds and extends over the top of the deposition apparatus. Cooling air flows downward over the surface of the quartz bell jar, which forms the reaction chamber, and radially inward through banks of radiant heater lamps that surround the bell jar. Each bank of heater lamps can be easily removed for servicing by rotating it into an open position about a pivot axis. This design allows for efficient maintenance and operation of the apparatus.

Career Highlights

Throughout his career, Maloney has demonstrated a commitment to advancing technology in the semiconductor field. His innovative methods have contributed to improved processes in epitaxial deposition, which is crucial for the production of high-quality semiconductor materials.

Collaborations

Maloney has worked alongside Joseph C. Moore, a fellow innovator in the industry. Their collaboration has likely fostered advancements in their respective fields, enhancing the overall impact of their work.

Conclusion

James R. Maloney's contributions to epitaxial deposition technology reflect his dedication to innovation and excellence. His patents not only demonstrate his technical expertise but also his ability to improve existing processes in the semiconductor industry.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…