Colchester, VT, United States of America

James R Johnson

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James R Johnson. Retrieved from https://idiyas.com/inventor/james-r-johnson-qlsne40l

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Innovations by James R Johnson

Introduction

James R Johnson is a notable inventor based in Colchester, Vermont. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of methods that enhance the reliability of semiconductor chips during manufacturing processes.

Latest Patents

James R Johnson holds 1 patent for his invention titled "Methods to prevent ECC (edge chipping and cracking) damage during die picking process." This patent describes a method aimed at preventing edge chipping and cracking damage encountered by semiconductor chips during the die picking operation. The invention also includes a device designed to mitigate potential damage during these processes.

Career Highlights

James R Johnson is associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to focus on advancing semiconductor technologies and improving manufacturing techniques.

Collaborations

Throughout his career, James has collaborated with talented individuals such as Timothy Charles Krywanczyk and Matthew R Whalen. These collaborations have contributed to the development of innovative solutions in the semiconductor industry.

Conclusion

James R Johnson's contributions to semiconductor technology through his patent demonstrate his commitment to innovation and excellence in his field. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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