James R Hightower

Title: Innovations of James R Hightower

Introduction

James R Hightower is a notable inventor based in Fort Collins, CO (US). He has made significant contributions to the field of integrated circuits, holding a total of 2 patents. His work focuses on improving the efficiency and density of electrical interconnections within integrated circuits.

Latest Patents

One of Hightower's latest patents is a method for forming the electrical interconnect levels and circuit elements of an integrated circuit. This innovative method utilizes a relatively thin layer of conductive material, which has a higher resistance than traditional metals like titanium nitride. This approach allows for relatively short local interconnections between circuit elements, enhancing the routing density of electrical interconnect levels. Additionally, this thin layer is employed to create macro elements such as capacitors, resistors, and fuses within the integrated circuit. By eliminating space-consuming transverse electrical interconnect lines, Hightower's invention reduces the number of manufacturing steps required to produce an integrated circuit.

Career Highlights

James R Hightower is associated with LSI Logic Corporation, where he has contributed to various projects and innovations in the field of integrated circuits. His expertise and inventive spirit have made a lasting impact on the industry.

Collaborations

Hightower has worked alongside talented colleagues, including Derryl D J Allman and Phonesavanh Saopraseuth. Their collaborative efforts have further advanced the development of innovative technologies in integrated circuits.

Conclusion

James R Hightower's contributions to the field of integrated circuits through his patents and collaborations highlight his role as a significant inventor. His innovative methods continue to influence the efficiency and design of modern electronic devices.