Beaverton, OR, United States of America

James P Nadeau


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2009-2017

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3 patents (USPTO):Explore Patents

Title: James P. Nadeau: Innovator in Topographical Control Technologies

Introduction

James P. Nadeau is a notable inventor based in Beaverton, OR (US). He has made significant contributions to the field of metrology applications through his innovative methods and apparatuses. With a total of 3 patents to his name, Nadeau continues to push the boundaries of technology.

Latest Patents

One of Nadeau's latest patents is titled "Method and apparatus for controlling topographical variation on a milled cross-section of a structure." This patent presents an improved method for controlling topographical variations when milling a cross-section of a structure. The method aims to reduce topographical variation on a cross-section of a write-head, thereby enhancing the accuracy of metrology applications. The technique involves using a protective layer made of a material that has mill rates at higher incidence angles, which closely approximate the mill rates of the structure at those angles. Additionally, topographical variation can be intentionally introduced by employing a protective layer with different mill rates.

Career Highlights

James P. Nadeau has established himself as a key figure in his field, working at Fei Company. His expertise in controlling topographical variations has made him a valuable asset to the organization.

Collaborations

Throughout his career, Nadeau has collaborated with talented individuals such as Pei Zou and Jason Harrison Arjavac. These collaborations have further enriched his work and contributed to the advancement of technology in his area of expertise.

Conclusion

James P. Nadeau's innovative work in controlling topographical variations has made a significant impact on metrology applications. His contributions continue to shape the future of technology in this field.

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