James Manley Pollard, Iii

Title: Innovations by James Manley Pollard, III

Introduction

James Manley Pollard, III is an accomplished inventor based in Bethel, CT (US). He has made significant contributions to the field of electrical interconnections, holding a total of 2 patents. His work focuses on developing innovative solutions to enhance the performance and reliability of electrical components.

Latest Patents

Pollard's latest patents include a "Thin film metal barrier for electrical interconnections" and a "Thin metal barrier for electrical interconnections." Both inventions describe an interconnect structure and barrier layer that incorporates a layer of TaN in the hexagonal phase between a first material, such as Cu, and a second material, such as Al, W, and PbSn. These inventions address the critical issue of Cu diffusion into materials that need to be isolated during temperature anneal at 500°C. The multilayer of TaN in the hexagonal phase and Ta in the alpha phase serves as an effective barrier layer, ensuring the integrity of electrical interconnections.

Career Highlights

James Manley Pollard, III is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in technology. His expertise in electrical interconnections has positioned him as a valuable asset within the company.

Collaborations

Throughout his career, Pollard has collaborated with notable colleagues, including Cyril Cabral, Jr. and Patrick William Dehaven. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

James Manley Pollard, III is a prominent inventor whose work in electrical interconnections has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to enhancing technology and addressing industry challenges.