Lempster, NH, United States of America

James M Cheever

This inventor holds 1 USPTO granted patent. Top assignee: Markem-Imaje Corporation. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James M Cheever. Retrieved from https://idiyas.com/inventor/james-m-cheever-r7yytqx7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Innovations of James M. Cheever

Introduction

James M. Cheever is an accomplished inventor based in Lempster, NH (US). He has made significant contributions to the field of printing technology. His innovative work focuses on enhancing the stability of material-handling systems used in printing apparatuses.

Latest Patents

James M. Cheever holds a patent for "Printing apparatuses and related apparatuses and methods." This invention involves apparatuses and methods that utilize material-handling systems. These systems ensure that the material maintains enhanced stability during its conveyance from a reservoir to a printhead. The design includes a conduit with a wall that defines an inner space, which carries a heated liquid to contact the material line.

Career Highlights

Cheever is associated with Markem-Imaje Corporation, where he applies his expertise in printing technology. His work has contributed to advancements in the efficiency and reliability of printing processes.

Collaborations

He has collaborated with notable colleagues, including Scott G. Page and L. Edward Drew, II. Their combined efforts have fostered innovation within their field.

Conclusion

James M. Cheever's contributions to printing technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to improving material-handling systems, showcasing the importance of stability in printing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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