Los Gatos, CA, United States of America

James L Belliveau


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: The Innovative Work of James L Belliveau in Image Analysis Technology

Introduction

James L Belliveau, based in Los Gatos, CA, has made significant contributions to the field of image analysis technology through his inventive work. His innovation focuses on methods and apparatus for searching and analyzing defect images and wafer maps, which play a crucial role in semiconductor fabrication and quality control.

Latest Patents

Belliveau holds a patent for an "Apparatus and methods for searching through and analyzing defect images and wafer maps." This patent introduces pioneering methods for automatically organizing and analyzing defect images without relying on a predefined set of classified images. The process entails sorting defect images based on associated identifying data, such as fabrication identifiers and lot numbers, allowing for efficient and precise defect analysis.

Career Highlights

James L Belliveau is affiliated with KLA-Tencor Technologies Corporation, a leader in process control and yield management solutions for the semiconductor industry. His innovative approaches have enhanced the capability of companies to improve manufacturing processes, minimize defects, and optimize production efficiency.

Collaborations

Throughout his career, Belliveau has collaborated with other talented professionals, including David R Bakker and Prashant Aji. These collaborations have fostered a creative environment that contributes to the advancement of technologies in image analysis and defect detection.

Conclusion

In conclusion, James L Belliveau's innovative contributions in the realm of defect image analysis are noteworthy. His unique patent provides companies within the semiconductor industry with valuable tools to enhance quality control processes. As technology evolves, his work continues to pave the way for significant advancements in image analysis and manufacturing efficiency.

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