This inventor holds 1 USPTO granted patent. Top assignee: Micronix Corporation. Active years: 1987.
Company Filing History:
Years Active: 1987
Title: Innovations of James J LaBrie in X-ray Photolithography
Introduction
James J LaBrie is an accomplished inventor based in Palo Alto, California. He has made significant contributions to the field of photolithography, particularly in the manufacturing of masks used in X-ray applications. His innovative approach has led to the development of a unique process that enhances the efficiency and effectiveness of photolithography techniques.
Latest Patents
LaBrie's most notable patent is titled "Process for manufacturing a mask for use in X-ray photolithography." This patent outlines a method that begins with a glass disk coated with a layer of boron nitride. The process involves removing a circular portion of the boron nitride layer to expose the glass disk beneath. Subsequently, the exposed portion of the glass disk is removed, resulting in a glass ring that retains the boron nitride membrane on one side. A layer of polyimide and an x-ray opaque substance is then deposited on the boron nitride membrane, which is patterned to create a mask utilized in X-ray photolithography.
Career Highlights
James J LaBrie is currently associated with Micronix Corporation, where he continues to innovate and contribute to advancements in photolithography. His work has been instrumental in improving the manufacturing processes within the industry.
Collaborations
LaBrie has collaborated with various professionals in his field, including his coworker Alexander R Shimkunas. Their combined expertise has fostered a productive environment for innovation and development.
Conclusion
James J LaBrie's contributions to the field of X-ray photolithography exemplify the impact of innovative thinking in technology. His patented process for manufacturing masks has paved the way for advancements in the industry, showcasing the importance of creativity and collaboration in scientific progress.