James J Colelli

Title: Innovations of James J Colelli

Introduction

James J Colelli is a notable inventor based in Jericho, Vermont, who has made significant contributions to the field of photolithography. With a total of four patents to his name, Colelli's work focuses on improving the efficiency and effectiveness of lithographic printing processes. His innovative approaches have garnered attention in the industry, particularly for their practical applications.

Latest Patents

Colelli's latest patents include a "Method and system for reducing particulate contamination in a pellicle air space." This invention addresses the issue of particulate matter that can adversely affect lithographic printing results. The method involves a reticle assembly that includes a pellicle frame and membrane, which encloses an air space over a photomask. By providing an adhesive surface on the interior wall of the pellicle frame, the invention allows for the dislodging of particulate matter from the photomask surface, directing it toward the adhesive surface to enhance the quality of lithographic optics.

Another significant patent is the "Dual use alignment aid," which features an alignment mark that incorporates aspects from multiple photolithography systems. This innovative mark can be read by the detectors of both systems, allowing for precision alignment without interference from the other system's aspects. This advancement is crucial for achieving high accuracy in photolithography processes.

Career Highlights

Colelli is currently associated with the International Business Machines Corporation (IBM), where he continues to develop and refine his inventions. His work at IBM has positioned him as a key player in the advancement of technologies related to photolithography and semiconductor manufacturing.

Collaborations

Throughout his career, Colelli has collaborated with notable colleagues, including Joseph Mundenar and Charles Arthur Whiting. These collaborations have contributed to the development of innovative solutions in the field.

Conclusion

James J Colelli's contributions to the field of photolithography through his patents and work at IBM highlight his role as a significant inventor. His innovative methods for reducing contamination and improving alignment in lithographic processes demonstrate his commitment to advancing technology in this critical area.