Clio, MI, United States of America

James Huff

This inventor holds 1 USPTO granted patent. Top assignee: Mitek Holdings, Inc.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James Huff. Retrieved from https://idiyas.com/inventor/james-huff

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Innovations by James Huff in HVAC Technology

Introduction

James Huff is an innovative inventor based in Clio, MI (US). He has made significant contributions to the field of HVAC technology. His work focuses on improving the efficiency and effectiveness of heating, ventilation, and air conditioning systems.

Latest Patents

James Huff holds a patent for a Thermal Isolating Housing Structure. This invention features an improved wall structure for HVAC enclosures that utilizes thermoplastic standoffs. These standoffs create an air space and separate the exterior wall structure from the interior wall structure. The design ensures that metallic fasteners securing the exterior walls do not transmit thermal energy from the external wall to the internal wall. This innovation enhances the thermal efficiency of HVAC systems.

Career Highlights

James Huff is currently employed at Mitek Holdings, Inc., where he continues to develop innovative solutions in HVAC technology. His expertise and dedication to improving energy efficiency have made him a valuable asset to the company.

Collaborations

James collaborates with his coworker, Zeke Carlyon, to further advance their projects and share insights in their field.

Conclusion

James Huff's contributions to HVAC technology through his innovative patent demonstrate his commitment to enhancing energy efficiency. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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