Mapleton, UT, United States of America

James Harkness

USPTO Granted Patents = 1 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations by James Harkness

Introduction

James Harkness is an accomplished inventor based in Mapleton, UT (US). He has made significant contributions to the field of engineering, particularly in the area of microchannel technology. His innovative approach has led to the development of a unique patent that addresses the challenges of interfacing metallic components.

Latest Patents

James Harkness holds a patent titled "Methods for interfacing a metallic microchannel and a metallic capillary." This patent describes systems and methods for effectively connecting a metallic capillary within a microchannel of a metallic body. The method involves inserting a portion of the metallic capillary into the microchannel, sintering the two components together, and utilizing a sacrificial powder to enhance the interface. This innovative approach allows for improved functionality and efficiency in microchannel applications.

Career Highlights

Harkness is affiliated with Brigham Young University, where he has been able to leverage his expertise in engineering and innovation. His work has not only contributed to academic research but has also paved the way for practical applications in various industries. His dedication to advancing technology is evident in his patent and ongoing research efforts.

Collaborations

James Harkness has collaborated with notable colleagues, including Henry Davis and Brian D. Jensen. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the quality of their research.

Conclusion

James Harkness is a notable inventor whose work in microchannel technology has led to significant advancements in the field. His patent demonstrates his innovative spirit and commitment to engineering excellence. Through his contributions, he continues to inspire future developments in technology.

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