Fort Lee, NJ, United States of America

James Feng

This inventor holds 2 USPTO granted patents. Top assignee: Reckitt & Colman Inc.. Active years: 1995-1999.


% Patents Active = 100.0

Average Co-Inventor Count = 1.5

ph-index = 2

Forward Citations = 59(Granted Patents)


Location History:

  • Fort Lee, NJ (US) (1995)
  • Ft. Lee, NJ (US) (1999)

Company Filing History:


Years Active: 1995-1999

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovations by James Feng in Cleaning Compositions

Introduction

James Feng is an accomplished inventor based in Fort Lee, NJ (US). He has made significant contributions to the field of cleaning compositions, holding a total of 2 patents. His work focuses on developing effective and user-friendly cleaning solutions.

Latest Patents

Feng's latest patents include innovative formulations for alkaline aqueous hard surface cleaning compositions. These compositions are designed to exhibit excellent cleaning efficacy against hardened dried or baked-on greasy soil deposits. They are also storage stable and non-irritating to the skin or mucous tissues of the user. Another notable patent is for a low-temperature non-caustic oven cleaning composition. This formulation comprises various components, including monoethanolamine and diethylene glycol monobutyl ether, and is effective at ambient room temperatures.

Career Highlights

James Feng is currently associated with Reckitt & Colman Inc., where he continues to innovate in the cleaning products sector. His work has contributed to the development of safer and more effective cleaning solutions for consumers.

Collaborations

Feng has collaborated with notable coworkers, including William Ronald Feuer and Ronald G Griepenburg, enhancing the innovative efforts within his team.

Conclusion

James Feng's contributions to cleaning compositions reflect his commitment to innovation and user safety. His patents demonstrate a blend of efficacy and care for the end user, marking him as a significant figure in the field of cleaning technology.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…