Pasadena, CA, United States of America

James Fakonas


 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: James Fakonas and His Patent on Direct Photopatterning

Introduction: James Fakonas, based in Pasadena, California, is an innovative inventor recognized for his contributions to the field of materials science. With a focus on advancing methodologies in photopatterning, he has successfully secured a patent that enhances the capabilities of materials used in various applications.

Latest Patents: James Fakonas holds a patent titled "Direct Photopatterning of Robust and Diverse Materials." This invention outlines methods for metathesizing olefins using catalysts that were previously deemed largely inactive. His work also introduces novel photosensitive compositions that function effectively as photoresists. These compositions are instrumental in patterning polymer layers on substrates and allow for considerable modifications, leading to exceptional functionalization. This innovation proves beneficial for developing sensors, drug delivery systems, and tissue scaffolds. Furthermore, Fakonas’s approach enables the creation of three-dimensional objects that facilitate access to precisely dimensioned devices, including photonic devices.

Career Highlights: James Fakonas is currently affiliated with the prestigious California Institute of Technology, where he contributes to the advancement of scientific knowledge and the development of practical innovations. His academic background and expertise have positioned him as a valuable asset in the field.

Collaborations: Throughout his career, Fakonas has collaborated with respected colleagues such as Raymond Weitekamp and Robert H. Grubbs. These partnerships have greatly enriched his research and innovation efforts, enhancing the impact of his work.

Conclusion: James Fakonas is a noteworthy inventor whose patent on direct photopatterning reflects significant advancements in materials science. Through his efforts, he continues to pave the way for new technologies and applications, demonstrating the vital role of innovation in shaping the future.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…