The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2020

Filed:

Oct. 03, 2014
Applicant:

California Institute of Technology, Pasadena, CA (US);

Inventors:

Raymond Weitekamp, Glendale, CA (US);

Robert H. Grubbs, South Pasadena, CA (US);

Harry A. Atwater, South Pasadena, CA (US);

James Fakonas, Pasadena, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 11/00 (2006.01); A61L 27/16 (2006.01); C08G 61/08 (2006.01); C08L 65/00 (2006.01); A61L 27/50 (2006.01); G03F 7/029 (2006.01); G03F 7/004 (2006.01); C07F 15/00 (2006.01); C08F 232/08 (2006.01);
U.S. Cl.
CPC ...
A61L 27/16 (2013.01); A61L 27/50 (2013.01); C08G 61/08 (2013.01); C08L 65/00 (2013.01); G03F 7/0042 (2013.01); G03F 7/029 (2013.01); C08F 232/08 (2013.01); C08G 2261/1426 (2013.01); C08G 2261/1432 (2013.01); C08G 2261/3325 (2013.01); C08G 2261/3342 (2013.01); C08G 2261/90 (2013.01); C08G 2261/94 (2013.01);
Abstract

The present invention relates to methods of metathesizing olefins using catalysts previously considered to be practically inactive. The present invention further relates to novel photosensitive compositions, their use as photoresists, and methods related to patterning polymer layers on substrates. Further, modifications to the compositions and method provide for an unprecedented functionalization of the compositions, useful for example in the preparation of sensors, drug delivery systems, and tissue scaffolds. The novel compositions and associated methods also provide for the opportunity to prepare 3-dimensional objects which provide new access to critically dimensioned devices, including for example photonic devices.


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