This inventor holds 3 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Micrometal Technologies, Inc.. Active years: 2011-2019.
Company Filing History:
Years Active: 2011-2019
Title: The Innovations of James E. Haller
Introduction
James E. Haller is an accomplished inventor based in Haverhill, MA (US). He has made significant contributions to the field of electrical engineering, particularly in the development of advanced materials for electrical shielding. With a total of 3 patents to his name, Haller's work has garnered attention for its innovative approach to enhancing electrical performance.
Latest Patents
Haller's latest patents focus on an electrical shielding material composed of metallized stainless steel monofilament yarn. This invention involves a yarn or multi-fiber formed from a plurality of micron diameter stainless steel monofilaments. These filaments have been rendered more conductive through coatings of electrolytically-deposited metal or metal alloy materials. The resulting metallized yarn exhibits very low electrical resistance, which significantly benefits electrical performance. This material is particularly useful as an RFI/EMI shielding solution, addressing the growing need for effective electromagnetic interference protection.
Career Highlights
Haller is currently associated with Micrometal Technologies, Inc., where he continues to innovate and develop new technologies. His expertise in electrical materials has positioned him as a key player in the industry, contributing to advancements that enhance the functionality and reliability of electronic devices.
Collaborations
Haller collaborates with Thomas F. Burke, leveraging their combined expertise to push the boundaries of electrical engineering and material science.
Conclusion
James E. Haller's contributions to electrical shielding materials exemplify the spirit of innovation in engineering. His patents reflect a commitment to improving electrical performance through advanced materials, making a lasting impact in the field.