Columbus, OH, United States of America

James Durand

This inventor holds 3 USPTO granted patents, plus 2 CIPO patents and 2 EPO patents. Top assignee: The Ohio State University. Active years: 2017-2020.


% Patents Active = 100.0


 

Average Co-Inventor Count = 4.6

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2017-2020

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3 patents (USPTO):Explore Patents

Title: Innovations of James Durand in Gas Compression Technology

Introduction

James Durand is an accomplished inventor based in Columbus, OH (US). He has made significant contributions to the field of gas compression technology, holding a total of 3 patents. His innovative methods have the potential to enhance efficiency in various industrial applications.

Latest Patents

Durand's latest patents focus on methods and systems for multi-stage compression of gas using a liquid. One of his notable inventions involves a method of compressing a gas by pumping a portion of a liquid from a first chamber to a second chamber containing gas at a first pressure. This process allows the liquid to compress the gas to a second pressure greater than the first. Another patent describes a system where a first volume of liquid is maintained in a high-pressure chamber, while a first volume of gas is kept in a second high-pressure chamber. The two chambers are fluidly connected through a high-pressure pump, enabling efficient gas compression.

Career Highlights

James Durand is affiliated with The Ohio State University, where he continues to work on innovative projects related to gas compression. His research and inventions have garnered attention for their practical applications in various industries.

Collaborations

Durand collaborates with notable colleagues such as Fabio Chiara and Robert Underhill, contributing to advancements in their respective fields.

Conclusion

James Durand's work in gas compression technology exemplifies the spirit of innovation and dedication to improving industrial processes. His patents reflect a commitment to advancing technology for practical applications.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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