Plano, TX, United States of America

James C Reed, Jr

This inventor holds 2 USPTO granted patents. Top assignee: Texas Instruments Corporation. Active years: 1996-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James C Reed, Jr. Retrieved from https://idiyas.com/inventor/james-c-reed-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 42(Granted Patents)


Company Filing History:


Years Active: 1996-1999

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2 patents (USPTO):Explore Patents

Title: Innovations of James C Reed, Jr.

Introduction

James C Reed, Jr. is a notable inventor based in Plano, TX (US). He has made significant contributions to the field of semiconductor technology. With a total of 2 patents, Reed has demonstrated his expertise and innovative spirit in his work.

Latest Patents

One of his latest patents is an "Apparatus for semiconductor wafer identification." This apparatus includes a batch wafer presentation system that receives a cassette carrying a plurality of wafers. The system arranges the wafers along an inclined presentation axis to simultaneously expose the bar code inscription on each wafer. A laser scanner is mounted on an arm assembly that travels along a track parallel to the presentation axis. The design allows for easy adjustment of the scanner's angular and spatial positions relative to the wafers.

Career Highlights

Reed is currently employed at Texas Instruments Corporation, where he continues to innovate and contribute to advancements in semiconductor technology. His work has been instrumental in improving the efficiency and accuracy of wafer identification processes.

Collaborations

Reed collaborates with fellow inventor Randolph William Kahn, enhancing the innovative capabilities within their projects.

Conclusion

James C Reed, Jr. exemplifies the spirit of innovation in the semiconductor industry. His patents and contributions reflect a commitment to advancing technology and improving processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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