Company Filing History:
Years Active: 1989
Title: Innovations of James C Mitchener in Semiconductor Technology
Introduction
James C Mitchener is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to chemical vapor deposition processes.
Latest Patents
Mitchener holds a patent for a method of low temperature chemical vapor deposition of silicon dioxide films. This patent describes a technique for depositing SiO.sub.2 based films on semiconductor structures using selected alkoxysilanes, such as tetramethoxysilane, trimethoxysilane, and triethoxysilane. These compounds decompose pyrolytically at lower temperatures than tetraethoxysilanes (TEOS). The introduction of ozone into the reaction chamber enhances deposition rates, reduces reaction temperatures, and improves the quality of the SiO.sub.2 film by facilitating more complete oxidation. Additionally, ozone serves as a reactant for doping SiO.sub.2 based films with oxides of phosphorus and boron.
Career Highlights
James C Mitchener is associated with Focus Semiconductor Systems, Inc., where he applies his expertise in semiconductor fabrication and innovation. His work has contributed to advancements in the efficiency and quality of semiconductor manufacturing processes.
Collaborations
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Conclusion
James C Mitchener's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the development of efficient manufacturing processes in the semiconductor industry.