Company Filing History:
Years Active: 2018-2019
Title: The Innovative Contributions of James Boyette
Introduction
James Boyette is a notable inventor based in Lake Worth, Florida, recognized for his contributions to the field of photomask technology. With a total of two patents to his name, Boyette has made significant advancements that enhance the efficiency of photomask production and maintenance.
Latest Patents
Boyette's latest patents focus on a method and apparatus for pellicle removal. This innovative technique involves cooling the adhesive between the pellicle frame and the photomask, allowing the adhesive properties to diminish. As a result, the adhesive can release from the photomask with minimal mechanical force, leaving little to no residue. The cooling process is achieved through manifolds containing coolant or by using spray nozzles that directly apply coolant to the pellicle frame.
Career Highlights
Throughout his career, James Boyette has worked with reputable companies such as Bruker Nano GmbH and Rave LLC. His experience in these organizations has contributed to his expertise in the field and has allowed him to develop innovative solutions for complex challenges in photomask technology.
Collaborations
Boyette has collaborated with talented individuals in his field, including Brian J. Grenon and Alexander M. Figliolini. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
James Boyette's contributions to the field of photomask technology through his innovative patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.