James A Shurtleff

Title: Innovations by James A. Shurtleff

Introduction

James A. Shurtleff is a notable inventor based in Endwell, NY (US). He has made significant contributions to the field of photolithography, particularly in developing environmentally friendly methods for treating waste. With a total of 3 patents to his name, Shurtleff's work reflects a commitment to innovation and sustainability.

Latest Patents

One of his latest patents is a method for treating photolithographic developer and stripper waste. This method utilizes simple, environmentally friendly organic compounds such as gamma-butyrolactone and benzyl alcohol. These compounds are employed to develop and strip various types of resists, including free radical-initiated, addition polymerizable resists, cationically cured resists, and solder masks. The developers and strippers may also include minor amounts of other solvents like methanol, ethanol, and isopropyl alcohol. During the development process, unpolymerized regions are effectively dissolved, while polymerized regions are debonded during the stripping process. Additionally, the method includes a treatment for combined developer and stripper rinse effluents to reduce biological oxygen demand in waste streams.

Career Highlights

James A. Shurtleff is associated with the International Business Machines Corporation (IBM), where he has contributed to various innovative projects. His work has been instrumental in advancing technologies related to photolithography and waste treatment.

Collaborations

Shurtleff has collaborated with notable coworkers, including Anilkumar Chinuprasad Bhatt and Gary S. Ksenak. Their combined expertise has further enhanced the impact of their innovations in the field.

Conclusion

James A. Shurtleff's contributions to the field of photolithography and waste treatment exemplify the importance of innovation in creating sustainable solutions. His work continues to influence the industry and promote environmentally friendly practices.