Munich, Germany

Jakob Valtl

This inventor holds 1 USPTO granted patent and 7 published patent applications. Top assignee: Infineon Technologies Ag. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jakob Valtl. Retrieved from https://idiyas.com/inventor/jakob-valtl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Jakob Valtl in Magnetic Field Technology

Introduction

Jakob Valtl is an accomplished inventor based in Munich, Germany. He has made significant contributions to the field of magnetic field technology, particularly in the determination of rotational and tilting movements. His innovative approach has led to the development of a unique device that enhances the accuracy of movement detection.

Latest Patents

Jakob Valtl holds a patent for a "Device for the magnetic-field-based determination of rotational and/or tilting movements." This device features a permanent magnet that can rotate and tilt around specific axes. It includes two magnetic field sensors designed to measure magnetic vector fields in at least two dimensions. The sensors are strategically arranged on a common substrate, ensuring precise measurements of the magnet's movements.

Career Highlights

Jakob Valtl is currently associated with Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to apply his innovative ideas in practical applications, contributing to advancements in technology.

Collaborations

Due to space constraints, the details of collaborations will not be included.

Conclusion

Jakob Valtl's contributions to magnetic field technology exemplify the spirit of innovation. His patent and work at Infineon Technologies AG highlight his role as a key player in advancing this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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