Chicago, IL, United States of America

Jake C Zappala

This inventor holds 1 USPTO granted patent. Top assignee: Uchicago Argonne, LLC. Active years: 2026.


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Jake C Zappala

Introduction

Jake C Zappala is an accomplished inventor based in Chicago, IL. He has made significant contributions to the field of vacuum ultra-violet technology. His innovative approach has led to the development of a unique patent that enhances the performance of VUV lamps.

Latest Patents

Zappala holds a patent for a "Magnetically Enhanced VUV Lamp." This invention involves a method and systems for improving the efficiency of vacuum ultra-violet lamps. The process includes providing a gas to a microwave cavity chamber, which has a specific length along its central axis. Excitation energy is supplied to the chamber, generating plasma within it. A compensator magnet is strategically placed toward one end of the chamber to create a compensation magnetic field, enhancing the lamp's performance. He has 1 patent to his name.

Career Highlights

Jake C Zappala is currently associated with UChicago Argonne, LLC, where he continues to work on innovative projects. His expertise in the field has made him a valuable asset to the organization.

Collaborations

Zappala has collaborated with notable colleagues, including Patrick R Stollenwerk and Kevin G Bailey. Their combined efforts contribute to advancements in their respective fields.

Conclusion

Jake C Zappala's work in enhancing vacuum ultra-violet lamps showcases his innovative spirit and dedication to technology. His contributions are paving the way for future advancements in this area.

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