Jai-Wook Park

Title: Innovator Jai-Wook Park: Advancing Copper Film Technology

Introduction

Jai-Wook Park, based in Pohang, South Korea, is a notable inventor with a focus on enhancing semiconductor fabrication processes. His pioneering work has led to the development of a significant technology in the field of chemical vapor deposition.

Latest Patents

Park holds a patent for "Organocuprous precursors for chemical vapor deposition of a copper film." This innovation features a liquid organocuprous compound characterized by a specific formula that facilitates a low-temperature CVD process. The resulting copper films produced are contaminant-free and exhibit excellent step-coverage and hole-filling properties, making them ideal for modern electronic applications.

Career Highlights

Jai-Wook Park is associated with the Postech Foundation, where he contributes to research that bridges gaps in technology and practical applications. His expertise in materials science is instrumental in pushing forward the boundaries of what is possible in semiconductor manufacturing.

Collaborations

Throughout his career, Park has collaborated with esteemed colleagues, including Shi-Woo Rhee and Doo-Hwan Cho. Their joint efforts focus on innovation and the advancement of technologies that have significant impacts in their respective fields.

Conclusion

Jai-Wook Park's contributions to the field of chemical vapor deposition are vital for the semiconductor industry. His innovative approach in developing organocuprous precursors illustrates the importance of practical research in driving technological advancement. With his continued work at the Postech Foundation, Park is poised to influence future developments in this critical area of technology.