The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2000
Filed:
Jan. 19, 1999
Applicant:
Inventors:
Shi-Woo Rhee, Pohang, KR;
Doo-Hwan Cho, Chilgok-gun, KR;
Jai-Wook Park, Pohang, KR;
Sang-Woo Kang, Seoul, KR;
Assignee:
Postech Foundation, , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F / ; C23C / ;
U.S. Cl.
CPC ...
556117 ; 556112 ; 427252 ;
Abstract
A liquid organocuprous compound of formula (I) of the present invention can be conveniently used in a low-temperature CVD process for the production of a contaminant-free copper film having good step-coverage and hole-filling properties: ##STR1## wherein: R.sup.1 represents a C.sub.3-8 cycloalkyl group, and
Quick Actions:
Rhee, Shi-Woo. (2000). Organocuprous precursors for chemical vapor deposition of a copper film (U.S. Patent No. 6090964). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6090964
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile