Seoul, South Korea

Jai Sung Lee

This inventor holds 1 USPTO granted patent. Top assignee: Industry-University Cooperation Foundation Hanyang University. Active years: 2011.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Innovations of Jai Sung Lee in Metal Oxide Nanoparticles

Introduction

Jai Sung Lee is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of nanotechnology, particularly in the manufacturing of metal oxide hollow nanoparticles. His innovative methods have the potential to enhance various applications in materials science and engineering.

Latest Patents

Jai Sung Lee holds a patent for a "Method for manufacturing metal oxide hollow nanoparticles and metal oxide hollow nanoparticles manufactured by the same." This patent describes a process that simplifies the production of metal oxide hollow nanoparticles using chemical vapor condensation with metal β-diketonates as precursors. The method involves several steps, including the preparation of the precursor, evaporation at a specific temperature, thermal decomposition, and the synthesis of the nanoparticles.

Career Highlights

Jai Sung Lee is associated with the Industry-University Cooperation Foundation at Hanyang University. His work focuses on advancing the techniques used in nanoparticle synthesis, which can lead to improved properties and functionalities in various applications.

Collaborations

He collaborates with esteemed colleagues such as Chang Woo Lee and Sung Soon Im, contributing to a dynamic research environment that fosters innovation and development in nanotechnology.

Conclusion

Jai Sung Lee's contributions to the field of nanotechnology through his patented methods for producing metal oxide hollow nanoparticles highlight his role as an influential inventor. His work not only advances scientific knowledge but also paves the way for practical applications in various industries.

Profile summary based on public USPTO records.
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