This inventor holds 1 USPTO granted patent. Top assignee: University of Kansas. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Jagaran Acharya: Innovator in Atomic Layer Deposition
Introduction
Jagaran Acharya is a notable inventor based in Lawrence, KS (US). He has made significant contributions to the field of materials science, particularly in the area of atomic layer deposition.
Latest Patents
Acharya holds a patent for "Atomic layer deposition of ultrathin tunnel barriers." This innovative method involves exposing a surface of a material, free of oxygen, to an initial water pulse for a specific pulse time and temperature. The process is designed to maximize hydroxylation of the surface. Following this, the hydroxylated surface is treated with alternating pulses of precursors, inducing reactions that form a tunnel barrier layer with an average thickness of no more than 1 nm. This layer is created without an intervening interfacial layer, showcasing Acharya's expertise in atomic layer deposition (ALD).
Career Highlights
Acharya is affiliated with the University of Kansas, where he continues to advance research in his field. His work has garnered attention for its potential applications in various technological domains.
Collaborations
Some of his notable coworkers include Judy Zhihong Wu and Jamie Wilt, who contribute to the collaborative research environment at the University of Kansas.
Conclusion
Jagaran Acharya's innovative work in atomic layer deposition exemplifies the impact of research on advancing technology. His contributions are paving the way for future developments in materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile