Jagadeeshkumar Sukumaran

Title: Jagadeeshkumar Sukumaran: Innovator in Substrate Cleaning Technology

Introduction

Jagadeeshkumar Sukumaran is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of substrate cleaning technology. His innovative approach has led to the development of a unique cleaning and drying module that enhances the efficiency of substrate processing.

Latest Patents

Jagadeeshkumar holds a patent for an "Integrated clean and dry module for cleaning a substrate." This invention features a process rotor equipped with grip pins to hold a substrate securely. The rotor is designed to rotate and move between lowered and raised positions. It incorporates a plurality of sweep arms, each with a nozzle mechanism to apply cleaning and drying fluids to the substrate. Additionally, a collection rotor operates synchronously with the process rotor, featuring a collection weir that gathers fluids and particles. Drain holes in the collection weir facilitate the removal of these collected materials, while an exhaust system draws air through the drain holes to enhance the cleaning process.

Career Highlights

Jagadeeshkumar is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display technology sector. His work focuses on advancing technologies that improve manufacturing processes and product quality.

Collaborations

Jagadeeshkumar collaborates with talented professionals in his field, including his coworker Jason A Rye. Together, they contribute to innovative projects that push the boundaries of substrate cleaning technology.

Conclusion

Jagadeeshkumar Sukumaran's contributions to substrate cleaning technology exemplify his commitment to innovation. His patent and work at Applied Materials, Inc. highlight his role as a key player in advancing manufacturing processes.