Suwon, South Korea

Jaeyong Choi

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Enjet Co. Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jaeyong Choi. Retrieved from https://idiyas.com/inventor/jaeyong-choi-obpig1u5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jaeyong Choi - Innovator in Semiconductor and Inkjet Technology

Introduction: Jaeyong Choi is an inventor based in Suwon-si, South Korea. He is currently associated with Enjet Co. Ltd. Jaeyong has made significant contributions to the fields of semiconductor devices and inkjet technology. Although he does not hold any granted patents, his work is noteworthy in the realm of innovation.

Latest Patent Applications: Jaeyong Choi's latest patent applications include two significant inventions. The first is a semiconductor device and electronic system that features a semiconductor substrate, an electrode structure with alternating electrodes and insulating layers, and various structures designed to enhance performance. The second application is for an inkjet printhead that utilizes a plurality of nozzles to eject liquid solutions through an electrohydrodynamic method. This printhead includes a first electrode for each nozzle, a voltage controller, and a second electrode to minimize electric field interference.

Conclusion: Jaeyong Choi is a promising inventor whose work in semiconductor devices and inkjet technology reflects his innovative spirit. His contributions, although not yet patented, showcase his potential impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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