Daejeon, South Korea

Jaeseung Han

This inventor holds 1 USPTO granted patent. Top assignee: Korea Advanced Institute of Science and Technology. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jaeseung Han. Retrieved from https://idiyas.com/inventor/jaeseung-han-403ulj9q

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jaeseung Han: Inventor of Localized Haptic Feedback Technology

Introduction

Jaeseung Han is an inventor based in Daejeon, South Korea, associated with the Korea Advanced Institute of Science and Technology (KAIST). His patent work includes technology for delivering localized haptic feedback through a display.

Latest Patents

Han is named on one patent: Haptic Device Providing Localized Haptic Feedback and Controlling Method Thereof. The invention describes a display-based haptic device with a haptic driving unit, signal controller, panels, a common electrode, and multiple electrode patterns. By adjusting the amplitude or phase of voltage signals applied to the electrode patterns, the controller can make output waves overlap, reinforce, or interfere, producing localized haptic feedback on a touch panel. Han’s reported portfolio includes 1 patent.

Career Highlights

Han’s listed institutional affiliation is KAIST. The patent reflects work on controlling haptic sensations at specific locations on a touch-sensitive display.

Collaborations

The provided information identifies Ki-Uk Kyung and Jihwan Park as Han’s coworkers. The patent description concerns a haptic device and control method, but the supplied details do not specify the coworkers’ roles in this invention.

Conclusion

Jaeseung Han’s documented patent work focuses on localized haptic feedback, using controlled electrical signals to create targeted tactile sensations on a display.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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