Suwon-si, South Korea

Jaemu Ha

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jaemu Ha. Retrieved from https://idiyas.com/inventor/jaemu-ha-a9u5agj3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Jaemu Ha - Innovator in Wireless Charging Technology

Introduction

Jaemu Ha is a prominent inventor based in Suwon-si, South Korea. He is known for his contributions to the field of wireless charging technology. His innovative approach has led to the development of a unique method that enhances the efficiency of electronic devices.

Latest Patents

Jaemu Ha holds a patent for a "Wireless charging method and electronic device supporting same." This patent describes an electronic device that includes a power reception coil, communication circuits, and a control circuit. The control circuit is designed to facilitate communication with external electronic devices, enabling efficient power transfer and data exchange.

Career Highlights

Jaemu Ha is currently employed at Samsung Electronics Ltd., a leading global technology company. His work at Samsung has allowed him to focus on advancing wireless charging technologies, contributing to the company's reputation for innovation in consumer electronics.

Collaborations

Jaemu Ha collaborates with talented colleagues, including Hyungjun Kwon and Jaesung Lee. Together, they work on various projects that aim to push the boundaries of technology and improve user experiences.

Conclusion

Jaemu Ha's contributions to wireless charging technology exemplify the spirit of innovation. His patent and work at Samsung Electronics Ltd. highlight his commitment to advancing electronic device capabilities. His efforts continue to shape the future of technology in meaningful ways.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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