Seongnam, South Korea

JaeJun Ban

This inventor holds 1 USPTO granted patent. Top assignee: Fci, Inc.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: JaeJun Ban. Retrieved from https://idiyas.com/inventor/jaejun-ban

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: JaeJun Ban: Innovator in Automatic Gain Control Technology

Introduction

JaeJun Ban is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of automatic gain control technology. His innovative approach has led to the development of a unique apparatus and method that enhances signal processing efficiency.

Latest Patents

JaeJun Ban holds a patent for an "Apparatus and method for automatic gain control." This invention focuses on rapidly and effectively completing automatic gain control by performing a gain control procedure only three times, regardless of the intensity of a received signal. The method utilizes peak values in an analog region and the output signal of an analog-digital converter, showcasing his expertise in signal processing.

Career Highlights

Currently, JaeJun Ban is employed at FCI, Inc., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of automatic gain control systems.

Collaborations

Throughout his career, JaeJun has collaborated with talented individuals such as Hyun Soo Kang and Beomjin Kim. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

JaeJun Ban's contributions to automatic gain control technology highlight his innovative spirit and dedication to advancing the field. His patent reflects a significant step forward in signal processing efficiency, marking him as a key figure in this area of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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