Suwon, South Korea

Jaeik Cha

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jaeik Cha. Retrieved from https://idiyas.com/inventor/jaeik-cha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jaeik Cha - Innovator in Dryer Technology

Introduction

Jaeik Cha is an inventor based in Suwon-si, South Korea. He has made significant strides in the field of appliance technology, particularly with his innovative dryer design. Although he currently holds no granted patents, his work reflects a commitment to advancing household technology.

Latest Patent Applications

Jaeik Cha's latest patent application is for a dryer that features a main body with a front panel, an inlet, and a base forming a bottom surface. The design includes a drum and a heat exchanger that is accessible through the front panel opening. The base of the dryer is equipped with a bottom portion that supports the heat exchanger and a vertical front wall portion. Additionally, the base has a cover that can open and close the front panel opening, along with a filter unit and a ground electrode on the front wall. The filter unit is designed with a fixer member that can be coupled to the front wall, allowing it to be secured in a first position and separated in a second position. This innovative design ensures that the fixer member is electrically connected to the ground electrode when in the first position.

Conclusion

Jaeik Cha's contributions to dryer technology showcase his inventive spirit and dedication to improving household appliances. His innovative designs have the potential to enhance user experience and efficiency in laundry care.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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