This inventor holds 1 USPTO granted patent. Top assignee: Agency for Defense Development. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Innovations of Jaeheon Lee in Filtration Technology.
Introduction
Jaeheon Lee is an innovative inventor based in Daejeon, South Korea. He has made significant contributions to the field of filtration technology, particularly in the design of absorption filter structures. His work focuses on enhancing filter efficiency while ensuring ease of use.
Latest Patents
Jaeheon Lee holds a patent for an "Adsorption filter structure or purification module and helmet comprising the same." This invention features an absorption filter structure designed to increase filter efficiency in a detachable form suitable for use with a helmet. The structure includes a filtration unit that allows external air to pass through an internal space in a specific filtration direction. It consists of an absorption layer, a filtering layer, and a shielding layer stacked within the filtration unit. Additionally, the design incorporates external and internal air vents to facilitate effective air filtering. The absorption filter structure is engineered to be easily detachable from the helmet, making it a versatile solution for users.
Career Highlights
Jaeheon Lee is currently employed at the Agency for Defense Development, where he continues to innovate and develop advanced filtration technologies. His work is crucial in enhancing the safety and efficiency of protective gear.
Collaborations
Jaeheon Lee collaborates with Heesoo Jung, contributing to the advancement of their projects and sharing insights in their respective fields.
Conclusion
Jaeheon Lee's contributions to filtration technology exemplify the importance of innovation in enhancing safety and efficiency. His patented designs reflect a commitment to improving user experience and functionality in protective equipment.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
