Suwon, South Korea

Jaehee You

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jaehee You. Retrieved from https://idiyas.com/inventor/jaehee-you

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Jaehee You - Innovator in Electronic Device Technology

Introduction

Jaehee You is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of electronic devices, particularly with his innovative designs that enhance sound propagation.

Latest Patents

Jaehee You holds a patent for an electronic device that includes a unique pipeline structure through which sound propagates. This electronic device features a housing with a front plate, a rear plate, and a side plate that creates a space for sound to travel. The design includes a speaker directed toward the front plate and a support member extending from the speaker. The pipeline structure is ingeniously designed to optimize sound quality by forming an acute angle with respect to a reference line.

Career Highlights

Jaehee You is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop cutting-edge technologies. His work has contributed to the advancement of electronic devices, making them more efficient and effective in sound delivery.

Collaborations

Jaehee collaborates with talented coworkers, including Taeeon Kim and Kiwon Kim, who contribute to the innovative environment at Samsung Electronics.

Conclusion

Jaehee You's contributions to electronic device technology exemplify the spirit of innovation. His patent showcases his ability to enhance sound propagation, making a significant impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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