Fishkill, NY, United States of America

Jaehak Kim


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2008

where 'Filed Patents' based on already Granted Patents

1 patent (USPTO):

Title: Jaehak Kim: Innovator in Dual-Damascene Interconnect Structures

Introduction

Jaehak Kim is an accomplished inventor based in Fishkill, New York, known for his innovative contributions to the field of semiconductor manufacturing. With a focus on improving interconnect structures, Kim holds a patent that demonstrates his expertise and forward-thinking approach in the industry.

Latest Patents

Kim's patent, titled "Methods of forming dual-damascene interconnect structures using adhesion layers having high internal compressive stresses," addresses the challenges of forming stable and reliable interconnects in semiconductor devices. The patent outlines a process for forming a first metal wiring pattern on a dielectric layer, followed by the application of a capping layer, specifically a SiCN layer. An adhesion layer is then deposited using a precise combination of gases—octamethylcyclotetrasilane (OMCTS) and helium—at specified volumetric flow rates. This innovative approach aims to create an adhesion layer with an internal compressive stress greater than 150 MPa, which enhances the layer's resistance to damaging effects during subsequent processing steps.

Career Highlights

Throughout his career, Jaehak Kim has worked with notable companies in the semiconductor industry, including Samsung Electronics Co., Ltd. and Chartered Semiconductor Manufacturing Ltd. These experiences have provided him with invaluable insights and expertise that he applied to his inventive processes.

Collaborations

Kim has collaborated with talented individuals in the field, including Darryl D Restaino and Johnny Widodo. Their collective efforts have contributed to advancements in semiconductor technologies and improvements in manufacturing processes.

Conclusion

Jaehak Kim's innovative work in creating robust interconnect structures highlights the importance of advancements in semiconductor technology. His patent not only showcases his technical prowess but also his commitment to enhancing the reliability and efficiency of electronic devices. As the industry continues to evolve, Kim’s contributions are likely to play a significant role in shaping future innovations in semiconductor manufacturing.

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