Gyeonggi-do, South Korea

Jae-Youl Kim

This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jae-Youl Kim. Retrieved from https://idiyas.com/inventor/jae-youl-kim-vpt3dhml

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Jae-Youl Kim in Substrate Treatment Technology.

Introduction

Jae-Youl Kim is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique support unit that enhances the efficiency of substrate processing.

Latest Patents

Jae-Youl Kim holds 1 patent for his invention titled "Support unit and apparatus for treating substrate." This patent describes a support unit designed to support a substrate effectively. The support unit includes a heating member that transmits thermal energy to the substrate. Additionally, it features a reflective plate that reflects thermal energy generated by the heating member back to the substrate. A cooling plate is also included, which has a cooling flow path for a cooling fluid. Furthermore, a gas supply line is integrated to supply gas to the space between the reflective plate and the cooling plate.

Career Highlights

Jae-Youl Kim is currently employed at Semes Co., Ltd., where he continues to innovate in substrate treatment technologies. His work has been instrumental in advancing the capabilities of substrate processing equipment.

Collaborations

Some of his coworkers include Soo Han Song and Chul Goo Kim, who contribute to the collaborative efforts within the company.

Conclusion

Jae-Youl Kim's innovative work in substrate treatment technology exemplifies the impact of dedicated inventors in advancing industrial processes. His contributions are paving the way for more efficient substrate processing solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…