Seoul, South Korea

Jae Woon Kim

This inventor holds 2 USPTO granted patents and 5 published patent applications. Top assignees: Adeka Corporation, Samsung Electronics Co., Ltd., Samsung Electronics Ltd.. Active years: 2025-2026.

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Jae Woon Kim: Innovator in Semiconductor Manufacturing

Introduction

Jae Woon Kim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique semiconductor device manufacturing method.

Latest Patents

Jae Woon Kim holds 1 patent for his invention related to semiconductor device manufacturing. The patent describes a method that includes providing a first layer with a first surface and a second layer that contains a trench exposing the first surface. The process involves forming a first polymer layer that fills the trench and performing a heat treatment to create a second polymer layer. This method enhances the physical properties of semiconductor devices, making them more efficient and reliable.

Career Highlights

Jae Woon Kim is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to collaborate with some of the brightest minds in the industry. His dedication to innovation has positioned him as a key player in semiconductor research and development.

Collaborations

One of his notable coworkers is Eun Hyea Ko, with whom he has likely shared insights and expertise in their field. Their collaboration may have contributed to advancements in semiconductor technology.

Conclusion

Jae Woon Kim's contributions to semiconductor manufacturing exemplify the spirit of innovation. His patent reflects a significant advancement in the industry, showcasing his expertise and commitment to technological progress.

Profile summary based on public USPTO records.
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