Cheonan, South Korea

Jae Wook Ahn

This inventor holds 1 USPTO granted patent. Top assignee: Lg N-Sys, Inc.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jae Wook Ahn. Retrieved from https://idiyas.com/inventor/jae-wook-ahn-yyrlizoj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Innovations of Jae Wook Ahn

Introduction

Jae Wook Ahn is an accomplished inventor based in Cheonan, South Korea. He has made significant contributions to the field of media dispensing technology. His innovative approach has led to the development of a unique device that enhances user convenience and security.

Latest Patents

Jae Wook Ahn holds a patent for a media reject device of a media dispenser. This invention includes a media reject box positioned within the main body of the dispenser. It features a reject hole for inserting defective media, a door unit for opening and closing the reject hole, and a locking unit that secures the door when the media reject box is removed. This design not only facilitates the disposal of defective media but also prevents theft, ensuring a more secure operation.

Career Highlights

Jae Wook Ahn is currently employed at LG N-Sys, Inc., where he continues to innovate and develop new technologies. His work at the company reflects his commitment to enhancing media dispensing systems and improving user experiences.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Jae Wook Ahn's contributions to media dispensing technology exemplify his innovative spirit and dedication to improving user convenience and security. His patent for the media reject device showcases his ability to address practical challenges in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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