Jae-Sung Yoon

Title: Jae-Sung Yoon: Innovator in Filtration and Printing Technologies

Introduction

Jae-Sung Yoon is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the fields of filtration and printing technologies. With a total of 2 patents, his work showcases innovative approaches to solving complex engineering challenges.

Latest Patents

One of Jae-Sung Yoon's latest patents is a hybrid type filtration structure for filtering liquid. This invention includes a first active layer, a porous supporting layer, and a permeable layer. The first active layer features a first nano pore inner wall combined with a functional group compound. The porous supporting layer, located beneath the first active layer, contains multiple pores, while the permeable layer is situated below the porous supporting layer. This design allows for selective water passage through membrane proteins within the lipid bilayers of the porous supporting layer. The connection between the first nano pore and the supporting layer facilitates efficient liquid flow.

Another notable patent is a method of manufacturing a roll for roll printing and roll imprinting. This method involves preparing an exterior with a printed pattern of a predetermined shape that possesses magnetic power. The exterior is attached to a central roll, also having magnetic power, which allows for cost-effective mass production of rolls for printing and imprinting applications.

Career Highlights

Jae-Sung Yoon is affiliated with the Korea Institute of Machinery and Materials, where he continues to advance his research and development efforts. His work has garnered attention for its practical applications and innovative designs.

Collaborations

Some of his notable coworkers include Yeong-Eun Yoo and Jeong-Hwan Kim, who contribute to the collaborative environment at the Korea Institute of Machinery and Materials.

Conclusion

Jae-Sung Yoon's contributions to filtration and printing technologies highlight his innovative spirit and dedication to engineering advancements. His patents reflect a commitment to developing solutions that address real-world challenges.