Changwon, South Korea

Jae Ryong Ha

This inventor holds 1 USPTO granted patent. Top assignee: Hanwha Techwin Co., Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jae Ryong Ha. Retrieved from https://idiyas.com/inventor/jae-ryong-ha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovations by Jae Ryong Ha in Privacy Masking Technology.

Introduction

Jae Ryong Ha is an innovative inventor based in Changwon-si, South Korea. He has made significant contributions to the field of image processing, particularly in privacy masking technology. His work focuses on enhancing privacy in captured images, which is increasingly important in today's digital age.

Latest Patents

Jae Ryong Ha holds a patent for a privacy masking method. This method is designed to accurately position a mask area on a privacy area in a captured image, regardless of any camera movement. The technology ensures that even with pan, tilt, and zoom movements, the mask area aligns perfectly with the privacy area. This innovation addresses a critical need for privacy in various applications.

Career Highlights

Jae Ryong Ha is currently employed at Hanwha Techwin Co., Ltd., a company known for its advancements in security and surveillance technology. His role involves developing cutting-edge solutions that enhance the functionality and reliability of imaging systems.

Collaborations

Jae Ryong Ha collaborates with Ki Bum Park, a fellow innovator in the field. Together, they work on projects that push the boundaries of image processing technology.

Conclusion

Jae Ryong Ha's contributions to privacy masking technology represent a significant advancement in the field of image processing. His innovative methods ensure that privacy is maintained in captured images, making a positive impact on security and surveillance applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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