San Jose, CA, United States of America

Jae Myung Yoo

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2020-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jae Myung Yoo. Retrieved from https://idiyas.com/inventor/jae-myung-yoo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 5.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020-2024

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Jae Myung Yoo: Innovator in Lithography Technology

Introduction

Jae Myung Yoo is a prominent inventor based in San Jose, CA (US). He has made significant contributions to the field of lithography technology, holding a total of 4 patents. His work focuses on improving processes related to substrate handling and thermal stabilization in photolithography systems.

Latest Patents

One of his latest patents is titled "Method for fast loading substrates in a flat panel tool." This invention relates to a method and apparatus for efficiently loading, processing, and unloading substrates. The processing system includes a load/unload system that is coupled to a photolithography system, featuring two sets of tracks with different heights and widths to facilitate the transfer of substrates.

Another notable patent is "Dynamic cooling control for thermal stabilization for lithography system." This invention provides a system and methods that enhance the lithography process by decreasing stabilization time and compensating for changes in total pitch during exposure pattern writing. The system includes a slab, a stage, a processing apparatus, and a chiller system designed to improve efficiency and performance.

Career Highlights

Jae Myung Yoo is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display manufacturing equipment industry. His innovative work has positioned him as a key figure in advancing lithography technologies.

Collaborations

Throughout his career, Jae has collaborated with notable colleagues, including Benjamin M Johnston and Cheuk Ming Lee. These collaborations have contributed to the development of cutting-edge technologies in the field.

Conclusion

Jae Myung Yoo's contributions to lithography technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the industry. His innovations continue to shape the future of substrate processing and thermal stabilization in photolithography systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…