Gunpo-si, South Korea

Jae Min Kim

This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jae Min Kim. Retrieved from https://idiyas.com/inventor/jae-min-kim-20mbm9ek

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jae Min Kim: Inventor in Substrate Processing Equipment.

Introduction

Jae Min Kim is an inventor associated with Gunpo-si, South Korea, and Semes Co., Ltd. His work includes an invention focused on improving electrical safety during substrate-processing equipment inspections.

Latest Patents

Kim is credited with 1 patent: “Substrate Processing Equipment and Method of Driving Substrate Processing Equipment.” The invention describes equipment and a control method designed to automatically cut off power to the main and branch circuit breakers when an operator opens the power distribution board door to inspect a process chamber or power supply system. The equipment includes a processing module with operational loads, a branch circuit breaker connected to those loads, a main circuit breaker supplying power to the branch breaker, and a power distribution board that houses the branch breaker. The main circuit breaker cuts off power when the board door is opened, helping reduce electrical hazards during inspection.

Career Highlights

Kim’s listed patent reflects work on safety mechanisms for substrate-processing systems. The invention connects access to the power distribution board with automatic power interruption, addressing a practical risk in equipment maintenance and inspection.

Collaborations

Kim is associated with Semes Co., Ltd. His listed coworker is Gun Min Lee.

Conclusion

Jae Min Kim’s patent centers on an automatic power-cutoff approach intended to make substrate-processing equipment inspections safer.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…