Company Filing History:
Years Active: 2007-2008
Title: Innovations by Jae-Man Youn
Introduction
Jae-Man Youn is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of FinFET structures. With a total of 2 patents to his name, Youn continues to push the boundaries of innovation in his field.
Latest Patents
One of Jae-Man Youn's latest patents involves a FinFET structure that employs a negative word line scheme. This design features a gate electrode doped with n+ impurity, which enhances the characteristics of the FinFET by either avoiding channel doping or executing it at a low density. The semiconductor substrate is formed in a first conductive type, with a fin active region projecting from its upper surface. An insulation layer is placed on the substrate, and a gate insulation layer is formed on the fin active region. Source and drain regions are created on both sides of the gate electrode within the fin active region.
Another notable patent focuses on bulk substrates in FinFETs with trench insulation surrounding FIN pairs. This device includes a semiconductor substrate with specific regions surrounded by a trench filled with an insulating layer. Recess holes are formed within these regions, allowing channel fins to be created by raised portions of the substrate. Gate lines extend across the channel fins, with source and drain regions connected by the channel fins.
Career Highlights
Jae-Man Youn is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop advanced semiconductor technologies. His work has been instrumental in enhancing the performance and efficiency of FinFET devices.
Collaborations
Youn has collaborated with notable colleagues, including Choong-Ho Lee and Dong-Gun Park, contributing to various projects and advancements in semiconductor technology.
Conclusion
Jae-Man Youn's contributions to the field of semiconductor technology through his innovative patents and collaborations highlight his role as a leading inventor. His work continues to influence the development of advanced electronic devices.