Gyeonggi-do, South Korea

Jae-Im Yun


Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 18(Granted Patents)


Location History:

  • Suwon, KR (2001)
  • Gyeonggi-do, KR (2005)

Company Filing History:


Years Active: 2001-2005

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2 patents (USPTO):Explore Patents

Title: Jae-Im Yun: Innovator in Ion Beam Technology

Introduction

Jae-Im Yun is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly in ion beam technology. With a total of two patents to his name, Yun's work focuses on improving the precision and efficiency of ion implantation processes.

Latest Patents

Yun's latest patents include a "Method and apparatus for measuring inclination angle of ion beam" and a "Method for monitoring Faraday cup operation in an ion implantation apparatus." The first patent describes a method and apparatus that measure the inclination angle of an ion beam during the implantation process into semiconductor wafers. This innovation includes a Faraday cup assembly that is rotatably installed, allowing for precise adjustments to the alignment angle. By accurately measuring the inclination angle, the incident angle of the ion beam can be finely tuned to prevent channeling and shadow effects, ensuring optimal ion implantation.

The second patent focuses on an ion implantation apparatus that incorporates a loopback device connected to a bias ring for a Faraday cup. This device detects current flow through the bias ring and generates an interlock signal to the controller. In response to this signal, the controller halts the implantation operation, enhancing the safety and reliability of the ion implantation process.

Career Highlights

Jae-Im Yun is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the semiconductor field. His work has been instrumental in advancing ion implantation technologies, which are critical for the production of high-performance semiconductor devices.

Collaborations

Yun has collaborated with notable colleagues such as Gyeong-su Keum and Hyung-Sik Hong. These partnerships have contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Jae-Im Yun's contributions to ion beam technology and semiconductor manufacturing highlight his role as a key innovator in the field. His patents reflect a commitment to enhancing precision and safety in ion implantation processes, making a significant impact on the industry.

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