This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Jae Hyun So: Innovator in Cerium Oxide Abrasives
Introduction
Jae Hyun So is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of abrasive materials, particularly through his innovative methods for producing cerium oxide abrasive particles. His work is essential for enhancing the efficiency of chemical mechanical polishing (CMP) processes.
Latest Patents
Jae Hyun So holds a patent for a "Method for producing improved cerium oxide abrasive particles and compositions including such particles." This patent outlines methods for manufacturing cerium oxide abrasives that are suitable for forming slurry compositions used in CMP processes. The innovative approach involves the heat treatment of a mixture of a cerium precursor compound, which results in primary cerium oxide particles incorporated into larger secondary abrasive particles. This method addresses the mechanical strength issues associated with the abrasives, thereby minimizing the risk of substrate surface damage during CMP processes.
Career Highlights
Jae Hyun So is affiliated with Samsung Electronics Co., Ltd., where he applies his expertise in materials science to develop advanced abrasive technologies. His work has been instrumental in improving the performance and reliability of CMP processes, which are critical in semiconductor manufacturing.
Collaborations
He collaborates with notable colleagues, including Nam Soo Kim and Kyoung Moon Kang, who contribute to the research and development efforts in the field of abrasive materials.
Conclusion
Jae Hyun So's innovative methods for producing cerium oxide abrasives represent a significant advancement in the field of materials science. His contributions not only enhance the efficiency of CMP processes but also demonstrate the importance of innovation in technology development.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
